Incorporating CFI60 optics for flawless inspection of 200mm wafers and masks

Combined with Nikon’s superior CFI60 LU/L optical system and an extraordinary new illumination system, this microscope provides images with greater contrast, high resolving power and darkfield images three times brighter than before. Used independently, or in combination with wafer loaders, the L200 series performs exceptionally precise optical inspection of wafers, photo masks, reticles and other substrates.