Nikon NEXIV VMR-10080 - Automated Measuring Systems - Measuring

Geared for ultra-wide measuring applications, the NEXIV VMR-10080 can handle large flat panels, shadow masks, etching sheets for lead frames, LCDs, mask patterns, and other large workpieces. Among its many features is a 1000 x 800 x 150mm stage stroke, bright diascopic illumination, pinpoint laser autofocusing, and advanced search functions. An ultra-high magnification model is also available.

LU Model (Universal Epi-Illuminator /Motorized Nosepiece)

Full range of Nikon CFI60 LU microscope objectives from 5x to 150x

Supports brightfield, darkfield, DIC, simple polarizing applications

Motorized quintuple universal nosepiece

Easy to use software controls all functions of the system

Type 1,2,3 Models

Its 1000 x 800mm stage travel is more than adequate to handle large flat panels, shadow masks, etching sheets for lead frames, LCDs, mask patterns, and other large work-pieces; 150mm Z-axis stroke; bright diascopic illumination.

3 models (type: 1, 2, 3) with 5 step zoom magnification to cover different fields of view and resolution requirements

Laser AF also enables measurements of height variance and warping in workpieces

Search function facilitates measurements of lands and holes of PCBs

Variety of illumination choices facilitate accurate edge detection even for vague geometries

High-speed stage and high-speed image processing provide high throughput

Z120X Model (with Maximum Magnification Module)

Achieves ultra-high magnification measurements with a long 1000 x 800mm stage stroke. Ideal for measuring minute line widths of large-size display panels.

Automatic measurements of batches of small parts

Laser AF achieves high-accuracy measurements of bump heights

Laser AF enables measurements of height variance and warping in workpieces

Search function enables measurements of lands and holes of PCBs

Search function also provides accurate measurements even when workpieces are not located properly on the stage

Variety of illumination choices facilitate accurate edge detection even for weak edges

High-speed stage and image processing provide higher throughput

Ideal for LCD glass substrates (pattern measurements) and organic EL glass substrates (pattern measurements)

Stroke (X x Y x Z)	Standard 1000 x 800 x 150mm (39.4 x 31.5 x 5.9 in); High Magnification 1000 x 800 x 115mm (39.4 x 31.5 x 4.5 in)
Z-axis Guide Accuracy	(3 + L/50) µm
Host Computer	Main unit IBM PC/AT compatible (Windows® 2000); CRT 21-inch color
Maximum Specimen Height	Standard 135mm, High Magnification 110mm
Auto Focus	(Standard model/High magnification model I) Image AF, Laser AF; (High magnification model II) Image AF, TTL Laser AF
Measuring Accuracy (X . Y)	Standard U1XY- (3.5 + L/200) µm; High Magnification U2XY- (3.5 + L/250) µm, High Magnification U1XY- (2.5 + L/250) ) µm
Field of View	(Standard) 10 x 8 to 1 x 0.8mm, (High magnification model I) 4 x 3.2 to 0.4 x 0.32mm, (High magnification model II) 2 x 1.6 to 0.2 x 0.16mm, (High magnification model III) 1 x 0.8 to 0.1 x 0.08mm
Minimum Readout	0.1 µm
Dimensions (W x D x H) and Weight (Main Body)	1534 x 2117 x 1793mm; 1500kg (60.4 x 83.3 x 70.6 in; 3,306.9 lb)
Footpring (D x W)	2600 x 2300mm (102.4 x 90.6 in)
Dimensions (W x D x H) and Weight (Illuminator)	220 x 130 x 360mm; 7 kg (8.7 x 5.1 x 14.2 in (15.4 lb)
Maximum Workpiece Weight	weight: 40kg (88.2 lb)
Zoom Magnification	5-step zoom for all models: (Standard) 0.75x to 7.5x, (High magnification model I) 1.875x t 18.75x, (High magnification II) 3.75x to 37.5x, (High magnification III) 7.5x to 75x
Power Source	AC 100 to V ±10%, 50/60 Hz
Power Consumption	Approx 18A
Camera	B/W CCD or color CCD camera